Chemically Amplified Photoresists with Precise Molecular Structure
Characterization and Properties
Synthesis and Formulation
The goal of this project is the synthesis of well-defined polypeptoid and demonstrate their potential as photoresists for electron-beam and extreme-UV lithography, Polymeric photoresists are limited in their sensitivity, resolution, and line-edge roughness also due in part to their molar mass distribution and variation in composition of single polymer chains. While most synthetic polymers, have monomer units distributed randomly along the polymer chain, polypeptoids, however, are characterized by low stochastics i.e., perfectly identical chains, with extremely low chemical, structural, and molar mass variability. and a widely adjustable length and composition. Varying the side-groups/ functionalities and thereby the properties such as hydrophilicity, adhesion and thermal properties allows the tailored design of a new generation of photoresists.